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(IT-NEWSWIRE.COM, June 14, 2018 ) Latest market study on “Photomask Market to 2025 by Type (Reticle, Working Mask, Master Mask and Copy Mask), Application (Semiconductor & IC, Discrete, Optoelectronics, Display Devices, MEMS and Others) and End-User Verticals (Semiconductor and IC and Flat Panel Display) – Global Analysis and Forecast”, the Photomask market is estimated to reach US$ 4,949.1 million by 2025 from US$ 3,320.0 million in 2016. The report includes key understanding on the driving factors of this growth and highlights the prominent players in the market and their developments.
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The global Photomask market by application is fragmented into semiconductor & IC, discrete, optoelectronics, display devices, MEMS and others. Photomasks find their largest applications in the manufacture of semiconductors. A set of photomasks is required to produce a complete semiconductor material. The photomask is protected by in this case is protected by a foil which is called pellicle to avoid any contamination to the chip board. The image carved on the photomask is then imprinted on the chip board by laser lithography or e-beam lithography. While using a photomask for lithography, the equipment has to fulfill certain specifications that include line width uniformity, accuracy, pattern position and minimum feature size. Photomask prototyping is used for high volume production of semiconductor devices
Compact and lightweight electronics are the prime demands from almost all industry verticals. The benefits provided by the transistors in communication field makes it much more lucrative to be adopted. The prime benefits of reduction in size, weight and power and secure communication provided by transistors and memories make it one of the most ideal components in electronics devices. Transistors and memories have different requirements in varying devices and are useful in a broad range of applications.
Thus, with the prominent growth in the sales of semiconductor devices, the demand for new set of photomasks is also set to increase. Advancement in processor technology by Qualcomm, Intel, AMD and Nvidia is posing a good growth opportunity for the photomask market. Availability of advanced technology for semiconductor packaging such as 3D packaging to shrink the size of semiconductor devices is set to multiply the demand for new photomask sets for the fabrication of these chips. Additionally, implementation of IoT (internet of Things) is further going to increase the penetration of semiconductors and IC in day to day things. Thus, the market for photomask possesses a huge growth opportunity for the photomask market during the forecasted period from 2017 – 2025.
Some of the leading photomask market players are Advance Reproduction Corporation, Compugraphics International Ltd, Nippon Filcon Co., ltd, Photoronics, Inc., and Taiwan Mask Corp. among others.
The report segments the global Photomask market as follows:
Global Photomask Market – By Type
Reticle
Working Mask
Master Mask
Copy Mask
Global Photomask Market – By Application
Semiconductor & IC
Discrete
Optoelectronics
Display Devices
Others
Global Photomask Market – By End-User Verticals
Semiconductor and IC
Flat Panel Display
Global Photomask Market – By Geography
North America
U.S.
Canada
Mexico
Europe
France
Germany
Italy
Spain
U.K.
Rest of Europe
Asia Pacific (APAC)
Japan
China
Korea
Taiwan
Middle East & Africa (MEA)
U.A.E.
South Africa
South America (SA)
Brazil
View Complete Report at https://bit.ly/2HOQVE3
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Source: EmailWire.Com 
Source: EmailWire.com
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